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Tetracarbonyl bis(m-(2-methyl-2-propane-thiolato))diiridium): a new CVD iridium precursor for thin film deposition on carbon
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Resumo(s)
Deposits of noble metal and particularly Pt, Pd, Rh or Ir prepared by Chemical Vapor Deposition (CVO) are of special interest because of their low resistivity and high termal stability. The major application is in microelectronics where they can replace gold as interconnects and contacts; other potential applications include protective coatings, gas sensors and catalysts. Among the noble metals cited above, iridium has been the subject of only a few studies, and suitable CVO precursors (i.e. volatile, easily synthesized, thermally stable during gas phase transport, characterized by a clean decomposition and non toxic) are relatively scarce.
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Contexto Educativo
Citação
Gomes, Helder; Faria, Joaquim; Figueiredo, José; Feurer, Roselyne; Kalck, Philippe; Serp, Philippe (2001). Tetracarbonyl bis(m-(2-methyl-2-propane-thiolato))diiridium): a new CVD iridium precursor for thin film deposition on carbon. In 5º Encontro da Divisão de Catálise da Sociedade Portuguesa de Química. Leiria.
Editora
Sociedade Portuguesa de Química